The password for your online exam is: pumpkinInstructions:Scan each sheet of your written work. You may use a scanner or your phone/tablet camera to scan your work.If using a phone or tablet for scanning, transfer your file(s) onto your computer while Honorlock is running. You can use the UND email or OneDrive tab that you opened in Step 1, or a desktop app such as iCloud, Dropbox, or Google Drive. Note: Honorlock will not allow you to access other cloud drives through a browser. Create a PDF file of your written work – combine images into a single PDF file. You can do so by using your scanner’s installed software, directly on your phone using a scanning app, or using a desktop application such as MS Word or Pages. Note: Honorlock will block access to third-party websites (such as combinePDF.com) to combine and create a single PDF.Once you have the PDF file on your computer’s local drive, open it and scroll through each page slowly to record an image of your work on the Honorlock screen recording. Make sure to complete this step carefully since this may be used as a backup in case of file corruption/Blackboard issues.Answer the Yes/No question below and proceed to the next question. DO NOT SUBMIT OR CLOSE YOUR TEST before answering all the questions.Question:I have created a single PDF of my written work and scrolled through it on my computer to record images of it on my Honorlock recording.

 You have created a VPC with two subnets. The web servers are running in a public subnet, and the database server is running in a private subnet. You need to download an operating system patch to update the database server. How you are going to download the patch

To connect your corporate data center to AWS, you need at least which of the following components? (Choose two.

What is the purpose of Availability Zones within an AWS Region?

When should you use caching in your architecture?

What is the primary role of a cloud architect?

Which AWS tool helps review workloads against architectural best practices?

Which AWS tool helps review workloads against architectural best practices?

An NMOS transistor fabricated in a 0.13-μm process has L=0.2μm and W=2μm. The process technology has Cox=12.8 fF/μm2, μn=450cm2/V·s, and Vtn=0.4 V. Neglect the channel-length modulation effect. If the transistor is to operate at the edge of the saturation region with ID=100 μA, find the value of VGS. Provide your answer in volts.

Question A: Consider a CMOS inverter fabricated in a 65-nm CMOS process for which VDD = 1 V, Vtn = -Vtp = 0.35 V, and μnCox = 5.4μpCox = 540 μA/V2. In addition, QN and QP have L = 65 nm, and (W/L)n = 1.5. Answer the following parts of the question.